This state-of-the-art cleanroom facility offers over 3360sq ft of Class 10,000 general and Class 1000 photo lab cleanroom space. The equipment toolsets provide full turnkey solutions for ongoing research projects and enable fabrication of advanced electronic and optoelectronic devices using innovative compound semiconductor materials.
Also included and adjacent to the new cleanroom is a 1375sq ft of lab space for Metal Oxide Chemical Vapor Deposition (MOCVD) and Molecular Beam Epitaxy (MBE) systems to advance compound semiconductor materials growth research. These toolsets incorporate leading edge technology for current and future industry needs.
The OU Cleanroom Facility has adopted a world-class level of safety protocols in both facilitation and operational standards. All equipment tool set operations are conducted with certification and qualification standards provided by university staff who are semiconductor industry veterans.
For more information, please contact Len Olona firstname.lastname@example.org at (405) 325-4374.